New Generation RF AP Plasma Source: “Hi-Z HEAD”

  • Overcome the limitations of AP plasma source by mounting the Impedance Booster

  • The industry’s first integration of AP plasma equipment integrated with RF matching module

  • Guaranteed full compatibility and reliability with existing YOUNGSIN-RF’s RF equipment.

  • Breakthrough dual plasma technology simplifies equipment and lowers costs

  • Wide range of effective range products from 100mm to 1500mm

High Reliability

  • RF Plasma with 30 years of know-how in the semiconductor field.

  • Impedance boosting function developed by our own technology provides smooth RF power supply and minimizes heat generation.

  • Guaranteed perfect compatibility and reliability with existing YOUNGSIN-RF equipment.

Simplification of the production process

  • Industry’s first AP plasma source with integrated AP plasma source and RF matching equipment.

  • Breakthrough dual plasma technology simplifies equipment and accelerates plasma processing.

  • Wide range of effective range products from 100mm to 1500mm.

Reasonable Price

  • Reduced facility implementation and maintenance costs with RF matching equipment integration and dual plasma technology.

  • Customizing AP plasma source according to process environment.

  • Reduced overall process costs with RF AP plasma packaged products.

“Hi-Z HEAD: High Impedance.”

The all-new RF AP plasma source “Hi-Z HEAD” will overcome the limitations of

existing AP plasma and become a good partner for customers.

TYPE 1) Hi-Z HEAD : Impedance Booster

“Hi-Z HEAD” with its proprietary impedance boost function. Experience maximum RF output performance and dramatic heat improvements.

  • Significantly improves heat generation and prevents chronic RF cable burnout

  • Various plasma effective ranges from 100mm to 1500mm

  • Dual plasma technology and even gas injection

View Detail

TYPE 2) Hi-Z HEAD : Integrated with RF matching

Maximize your process efficiency by integrating the AP plasma source with RF matching network.

  • Integrates the industry’s first RF matching equipment with an AP plasma source.

  • Free from RF cable lengths and simplify the process

  • Cost savings through streamlined device configuration

View Detail